Q1: Easily achievely a high wavelength resolution, but will defect the mask Q2: No longer have defect issue, but resolution is restricted to a micrometer level Q3: scan the mask; step the wafer; using a slit light source to scan the mask, and then step the wafer, repeat until the whole wafer is exposed. Q4: 436nm g line, 365nm i line Q5: ~240nm KrF laser. 193nm ArF laser.
Q1: Easily achievely a high wavelength resolution, but will defect the mask
Q2: No longer have defect issue, but resolution is restricted to a micrometer level
Q3: scan the mask; step the wafer; using a slit light source to scan the mask, and then step the wafer, repeat until the whole wafer is exposed.
Q4: 436nm g line, 365nm i line
Q5: ~240nm KrF laser. 193nm ArF laser.
PDF copies of all the slides in this course are available at:
www.lithoguru.com/scientist/CHE323/course.html