hmm if you combine multiple waves at different frequencies you could instead use the standing wave to your advantage and create a flatter edge. For example such as how a square wave is formed by adding up multiple sine waves at different periods and frequencies.
The pitch, equal to the linewidth plus the spacewidth, is constant and does not vary with resist thickness. Thus, the swing curve min and max will be inverted for a space compared to a line.
Brilliant explanation!
If post-exposure baking is not used to smooth standing waves, what else can we use post-exposure baking for? Increase the adhesion of photoresist?
You are correct. Also, for chemically amplified resists, the PEB is an essential step in the reaction to change the solubility of the resist.
hmm if you combine multiple waves at different frequencies you could instead use the standing wave to your advantage and create a flatter edge. For example such as how a square wave is formed by adding up multiple sine waves at different periods and frequencies.
He kinda mentions this at 12:30 about broadband illumination. It is one method of reducing standing waves.
I suppose that standing waves are not an issue with EUV since it takes a lot of effort to make an EUV mirror?
I have been working my way through your lectures and found them very interesting. How is the bottom anitreflective coating applied?
Organic BARCs are spin coated on the wafer. Inorganic BARCs are typically deposited with CVD.
I wanted to know how to plot the swing curve(the linewidth vs resist thickness plot) ? Like what should be the equation may I know please?
Thank you for the video. I like to know if the swing curve max and min get inverted if we measure space width instead of line width?
The pitch, equal to the linewidth plus the spacewidth, is constant and does not vary with resist thickness. Thus, the swing curve min and max will be inverted for a space compared to a line.
Thank you for the explanation.