Engineering Resist Profile for Liftoff Applications

Dr. Edmond Chow discusses how to engineer resist profile for high yield metal liftoff using LOR (Liftoff Resist) using a two-steps development process. General principles in designing resist stacks and compatibility issues are also be discussed.

[@user-gv4gi1gz8e]

Thanks for the good video! But I wonder if the e-beam resist is damaged due to SEM at 12:05.
I think there is not any coating metal such as Pt at the cross-sectional plane. Could you answer it to me? Thanks in advance.

[@hussoe4321]

Thanks a lot.
You said, bilayer lift-off is the best, no need to use sonication. I think you said sonication is not good, why? Does sonication affect the LER (line edge roughness)?