Contamination Control Solutions throughout the Semiconductor Manufacturing process

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  • čas přidán 21. 11. 2023
  • Complete solutions for contamination monitoring and control throughout semiconductor manufacturing.
    20 nm for liquids: chemicals and Ultrapure water
    batch sampling options to 20nm
    Airborne molecular at 70 ppt
    10 nm condensation airborne particle counter
    use with a Particle Seeker manifold for wide areas.
    Supported by global team of application engineer experts.
  • Věda a technologie

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